Substrate processing apparatus capable of cleaning inside thereof and cleaning control apparatus for controlling cleaning process of substrate processing apparatus
View Patent ↗A cleaning control apparatus capable of performing a cleaning process efficiently regardless of qualities and thicknesses of films formed in a process tube and a gas supply nozzle. The cleaning control apparatus employs cleaning request signal output units configured to output cleaning request signals requesting cleaning processes of a silicon-containing gas supply system and nitriding source gas supply system when accumulated amounts of the molecules of the silicon-containing gas and the nitriding source gas exceeds preset values.
1. A substrate processing apparatus comprising:
a process chamber accommodating a substrate;
a first gas introducing part configured to supply a first source gas and a cleaning gas into the process chamber, the first source gas comprising at least one of a plurality of elements;
a second gas introducing part configured to supply a second source gas into the process chamber, the second source gas comprising at least one of the plurality of elements other than those of the first source gas;
a third gas introducing part connected to a lower side of the process chamber at a position where the substrate is not placed, the third gas introducing part being configured to supply the cleaning gas into the process chamber;
an exhaust unit configured to exhaust an atmosphere inside the process chamber;
a controller configured to control the first gas introducing part, the second gas introducing part, the third gas introducing part and the exhaust unit to perform, after depositing a film on the substrate by supplying the first source gas and the second source gas into the process chamber, a first cleaning process to remove a first deposition substance attached to an inner wall of the first gas introducing part by supplying the cleaning gas to the first gas introducing part, wherein a cleaning condition is set according to an accumulated supply time of the first source gas supplied into the process chamber through the first gas introducing part, and a second cleaning process so as to remove a second deposition substance attached to an inside of the process chamber and having a different chemical composition from that of the first deposition substance by supplying the cleaning gas into the process chamber through the third gas introducing part wherein the cleaning condition is set according to an accumulated thickness of the film formed on the substrate; and
wherein the controller is configured to set an inside pressure of the process chamber in the first cleaning process lower than that of the second cleaning process.
2. The apparatus of claim 1 , wherein the cleaning condition comprises a pressure of the inside of the process chamber and a flowrate of the cleaning gas.
3. The apparatus of claim 1 , wherein the first deposition substance comprises the at least one of the plurality of elements as a main component, and the second deposition substance comprises the plurality of elements a main component.