Method of manufacturing semiconductor device including removal of deposits from process chamber and supply portion

1. A method of manufacturing a semiconductor device, comprising:

carrying a substrate into a process chamber;

depositing a thin film on the substrate by supplying inside the process chamber (a) through a first supply portion, a first film deposition gas including at least one element among plural elements composing the thin film to be deposited and capable of depositing a film by itself and (b) through a second supply portion a second film deposition gas including at least another element among the plural elements and incapable of depositing a film by itself, while heating an interior of the process chamber and an interior of the first supply portion at a same temperature at which the first film deposition gas undergoes heat decomposition;

carrying the substrate on which the thin film is deposited out from inside the process chamber; and

removing a first deposit deposited on an interior surface of the process chamber and including the plural elements and a second deposit deposited on an interior surface of the first supply portion, including the at least one element and having a chemical composition different from a chemical composition of the first deposit, through etching reaction respectively, by supplying a cleaning gas inside the process chamber and inside the first supply portion while changing at least one of a supply flow rate, a concentration, and/or a material between a cleaning gas to be supplied inside the process chamber and a cleaning gas to be supplied inside the first supply portion, while heating the interior of the process chamber and the interior of the first supply portion at a same temperature.

2. The method of claim 1 , wherein

the first film deposition gas includes a silicon-containing gas;

the second film deposition gas includes at least one of a nitrogen-containing gas, an oxygen-containing gas, and a carbon-containing gas;

the thin film includes silicon and at least one element among nitrogen, oxygen, and carbon; and

in the thin film depositing, a deposit chiefly made of silicon is deposited on the interior surface of the first supply portion and a deposit chiefly made of silicon and at least one element among nitrogen, oxygen, and carbon is deposited on the interior surface of the process chamber.

3. The method of claim 1 , wherein

the first supply portion has plural nozzles; and

in the thin film depositing, the first film deposition gas is supplied from plural points inside the process chamber via the plural nozzles, while heating the interior of the process chamber and interiors of the plural nozzles at the same temperature at which the first film deposition gas undergoes heat decomposition.

4. The method of claim 1 , wherein

in the deposits removing, end points of the cleaning inside the process chamber and the cleaning inside the first supply portion are made to coincide with each other.

5. The method of claim 1 , wherein

the cleaning gas includes at least one gas selected from the group consisting of a nitrogen trifluoride gas, a chlorine trifluoride gas, a fluorine gas, a hydrogen fluoride gas, and a chlorine gas.

6. The method of claim 1 , wherein

the cleaning gas is at least one gas selected from the group consisting of a nitrogen trifluoride gas, a chlorine trifluoride gas, a fluorine gas, a hydrogen fluoride gas, and a chlorine gas diluted with at least one gas selected from the group consisting of a nitrogen-containing gas, an oxygen-containing gas, and an inert gas.

7. The method of claim 1 , wherein

in the thin film depositing, the thin film is deposited on each of plural substrates while the substrates are aligned at intervals in multiple stages in an almost horizontal posture inside the process chamber.

8. A method of manufacturing a semiconductor device, comprising:

carrying a substrate inside a process chamber;

depositing a thin film including silicon and nitrogen on the substrate by supplying a silane-based gas through a first supply portion and a nitrogen-containing gas through a second supply portion inside the process chamber, while heating an interior of the process chamber and an interior of the first supply portion at a same temperature at which the silane-based gas undergoes heat decomposition;

carrying the substrate on which the thin film is deposited out from inside the process chamber; and

removing a first deposit chiefly made of silicon and nitrogen and deposited on the interior of the process chamber and a second deposit chiefly made of silicon and deposited on the interior of the first supply portion through etching reaction respectively, by supplying a cleaning gas inside the process chamber and inside the first supply portion while changing at least one of a supply flow rate, a concentration, and/or a material between a cleaning gas to be supplied inside the process chamber and a cleaning gas to be supplied inside the first supply portion, while heating the interior of the process chamber and the interior of the first supply portion at a same temperature.

9. The method of claim 1 , wherein

the first film deposition gas includes a silicon-containing gas;

the second film deposition gas includes nitrogen-containing gas,

the thin film includes silicon and nitrogen; and

in the thin film depositing, a deposit chiefly made of silicon is deposited on the interior surface of the first supply portion and a deposit chiefly made of silicon and nitrogen is deposited on the interior surface of the process chamber.

10. The method of claim 1 , wherein

the first film deposition gas includes a silicon-containing gas;

the second film deposition gas includes an oxygen-containing gas,

the thin film includes silicon and oxygen; and

in the thin film depositing, a deposit chiefly made of silicon is deposited on the interior surface of the first supply portion and a deposit chiefly made of silicon and oxygen is deposited on the interior surface of the process chamber.

11. The method of claim 1 , wherein

the first film deposition gas includes a silicon-containing gas;

the second film deposition gas includes a carbon-containing gas,

the thin film includes silicon and carbon; and

in the thin film depositing, a deposit chiefly made of silicon is deposited on the interior surface of the first supply portion and a deposit chiefly made of silicon and carbon is deposited on the interior surface of the process chamber.

12. The method of claim 1 , wherein

the first film deposition gas includes a silicon-containing gas;

the second film deposition gas includes a nitrogen-containing gas and an oxygen-containing gas,

the thin film includes silicon, nitrogen and oxygen; and

in the thin film depositing, a deposit chiefly made of silicon is deposited on the interior surface of the first supply portion and a deposit chiefly made of silicon, nitrogen and oxygen is deposited on the interior surface of the process chamber.

13. The method of claim 1 , wherein

the first film deposition gas includes a silicon-containing gas;

the second film deposition gas includes a nitrogen-containing gas and a carbon-containing gas,

the thin film includes silicon, nitrogen and carbon; and

in the thin film depositing, a deposit chiefly made of silicon is deposited on the interior surface of the first supply portion and a deposit chiefly made of silicon, nitrogen and carbon is deposited on the interior surface of the process chamber.

14. The method of claim 1 , wherein

the first supply portion has at least one nozzle; and

in the thin film depositing, the first film deposition gas is supplied via the nozzle, while heating the interior of the process chamber and an interior of the nozzle at the same temperature at which the first film deposition gas undergoes heat decomposition.

15. A method of cleaning, comprising:

providing a process chamber in which a thin film is deposited on a substrate by supplying inside the process chamber (a) through a first supply portion, a first film deposition gas including at least one element among plural elements composing the thin film to be deposited and capable of depositing a film by itself and (b) through a second supply portion a second film deposition gas including at least another element among the plural elements and incapable of depositing a film by itself, while heating an interior of the process chamber and an interior of the first supply portion at a same temperature at which the first deposition gas undergoes heat decomposition;

removing a first deposit deposited on an interior surface of the process chamber and including the plural elements and a second deposit deposited on an interior surface of the first supply portion, including the at least one element and having a chemical composition different from a chemical composition of the first deposit, through etching reaction respectively, by supplying a cleaning gas inside the process chamber and inside the first supply portion while changing at least one of a supply flow rate, a concentration, and/or a material between a cleaning gas to be supplied inside the process chamber and a cleaning gas to be supplied inside the first supply portion, while heating the interior of the process chamber and the interior of the first supply portion at a same temperature.

16. The method of claim 1 , wherein

during the step of removing the first deposit, a supply period of the cleaning gas to be supplied inside the process chamber is different from a supply period of the cleaning gas to be supplied inside the first supply portion.

17. The method of claim 1 , wherein

during the step of removing the first deposit, a timing of a supply start or a supply stop between the cleaning gas to be supplied inside the process chamber and the cleaning gas to be supplied inside the first supply portion is different.

18. The method of claim 1 , wherein

during the step of removing the first deposit, a first cleaning gas is supplied inside the process chamber as the cleaning gas and a second cleaning gas is supplied inside the first supply portion as the cleaning gas, the first cleaning gas being different from the second cleaning gas in material.

19. The method of claim 1 , wherein

the first supply portion includes a plurality of nozzles; and

during the step of removing the first deposit, the cleaning gas is supplied inside the plurality of nozzles while changing at least one of a supply flow rate, a concentration, or a material between the cleaning gas to be supplied inside at least one nozzle among the plurality of nozzles and the cleaning gas to be supplied inside at least another nozzle among the plurality of nozzles, while heating the interior of the process chamber and interiors of the plurality of nozzles at a same temperature.

20. The method of claim 1 , wherein

the first supply portion includes a plurality of nozzles; and

during the step of removing the first deposit, the cleaning gas is supplied inside the plurality of nozzles while changing a supply period between the cleaning gas to be supplied inside at least one nozzle among the plurality of nozzles and the cleaning gas to be supplied inside at least another nozzle among the plurality of nozzles, while heating the interior of the process chamber and interiors of the plurality of nozzles at a same temperature.