Substrate processing method
View Patent ↗A substrate processing method for use in a substrate processing apparatus having a stocker therein which stores a multiplicity of dummy substrates; a reaction chamber for producing semiconductor products; and a transferring unit for transferring into the reaction chamber a process substrate and the dummy substrate stored in the stocker in order to form a film on the process substrate, the method includes transferring one dummy substrate selected among the dummy substrates stored in the stocker to the reaction chamber without being out of the apparatus; and introducing a cleaning gas into the reaction chamber to clean said one dummy substrate within the reaction chamber.
1. A substrate processing method for use in a substrate processing apparatus having a stocker therein which stores a multiplicity of dummy substrates; and a reaction chamber for producing semiconductor products, the method comprising:
transferring into the reaction chamber a process substrate and a dummy substrate selected among the dummy substrates stored in the stocker, the stocker being placed within the apparatus;
forming a film on the process substrate and the dummy substrate;
unloading the dummy substrate and the process substrate from the reaction chamber and loading the unloaded dummy substrate into the stocker;
transferring the loaded dummy substrate from the stocker to the reaction chamber; and
introducing a cleaning gas into the reaction chamber to simultaneously clean the reaction chamber and the dummy substrate within the reaction chamber.
2. The method as recited in claim 1 , further comprising counting the number of usages in processing of each dummy substrate stored in the stocker so as that the number of usages of the dummy substrate is not greater than a predetermined number.