Method of manufacturing semiconductor device
View Patent ↗Described herein is a technique capable of improving the productivity of manufacturing of a semiconductor device in a method of processing a film by repeating different processes. A method of manufacturing a semiconductor device may include: (a) loading a substrate into a process vessel; (b) forming a first layer by supplying a first gas into the process vessel by a gas supply unit while maintaining the substrate at a first temperature by a temperature control unit; and (c) forming a second layer different from the first layer by supplying a second gas different from the first gas into the process vessel by the gas supply unit while maintaining the substrate at a second temperature different from the second temperature by the temperature control unit.
1. A method of manufacturing a semiconductor device, comprising:
(a) loading a substrate into a process vessel;
(b) forming a first layer by supplying a first gas into the process vessel by a gas supply unit while maintaining the substrate at a first temperature by a temperature control unit; and
(c) forming a second layer different from the first layer by supplying a second gas different from the first gas into the process vessel by the gas supply unit while maintaining the substrate at a second temperature different from the first temperature by the temperature control unit, wherein
the temperature control unit comprises: a heat exchanger unit facing a back side of the substrate and configured to adjust a temperature of the substrate; an elevation unit configured to adjust a distance between the heat exchanger unit and the substrate; and a lamp configured to heat the substrate from the back side thereof, and
a distance between the heat exchanger unit and the substrate in (b) is different from a distance between the heat exchanger unit and the substrate in (c).
2. The method of claim 1 , wherein the first gas comprises a first source gas containing a first element supplied by a first source gas supply unit included in the gas supply unit, a reactive gas reactive with the first source gas is further supplied by a reactive gas supply unit included in the gas supply unit in (b), and the second gas comprises a second source gas containing a second element different from the first element supplied by a second source gas supply unit included in the gas supply unit, and the reactive gas reactive with the second source gas is further supplied by the reactive gas supply unit in (c), and
wherein the temperature control unit is configured to maintain the temperature of the substrate at the first temperature in (b) and the second temperature in (c).
3. The method of claim 2 , wherein an amount of heat radiated from the lamp in (b) is different from an amount of heat radiated from the lamp in (c).