Patent Assignment
Reel/Frame 012398/0534
Assignment of Assignor's Interest
Recorded: 2001-12-28
Pages: 3
Assignee
HITACHI KOKUSAI ELECTRIC INC.
14-20, 3-CHOME, HIGASHI-NAKANO, NAKANO-KU, TOKYO, JAPAN
Covered Property
(1)
Methods of Manufacturing Semiconductor Devices with Ruthenium Films Formed by Cvd Using an Oxygen-Containing Reactant Gas
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.