IP Library › Granted Patent US 6,461,961
Granted Patent Utility
US 6,461,961 · Confirmation No. 8957

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES WITH RUTHENIUM FILMS FORMED BY CVD USING AN OXYGEN-CONTAINING REACTANT GAS

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 Code Description Pages PDF
2001-12-26 TRNA Transmittal of New Application 5 View
2001-12-26 SPEC Specification 20 View
2001-12-26 CLM Claims 5 View
2001-12-26 ABST Abstract 1 View
2001-12-26 DRW Drawings-only black and white line drawings 7 View
2001-12-26 OATH Oath or Declaration filed 4 View
2001-12-26 LET. Miscellaneous Incoming Letter 1 View
2001-09-27 TRNA Transmittal of New Application 4 View
2001-09-27 SPEC Specification 13 View
2001-09-27 CLM Claims 4 View
2001-09-27 ABST Abstract 1 View
2001-09-27 DRW Drawings-only black and white line drawings 7 View
2001-09-27 OATH Oath or Declaration filed 3 View
2001-09-27 LET. Miscellaneous Incoming Letter 1 View
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Quick Facts
Patent No.
US 6,461,961
App. No.
09/963,665
Filed
2001-09-27
Granted
2002-10-08
Pub. No.
US20020055254A1
Art Unit
2813
PTA
-101 days