Substrate processing apparatus
View Patent ↗Disclosed is a substrate processing apparatus, including: a processing chamber to accommodate a plurality of substrates therein in such a way that the substrate are vertically stacked; a gas supply system to supply processing gas into the processing chamber; an exhaust system to exhaust an atmosphere from the processing chamber; at least a pair of electrodes made of flexible member extending in a stacking direction of the substrates to activate the processing gas; and protecting tubes to accommodate the electrodes therein, wherein each of the protecting tubes is provided with a bent portion at a higher position than an uppermost substrate, and a tip end of each of the electrodes is located on a tip end side of each of the protecting tubes over the bent portion.
1. A substrate processing apparatus, comprising:
a processing chamber to accommodate a plurality of substrates therein in such a way that the substrate are vertically stacked;
a gas supply system to supply processing gas into the processing chamber;
an exhaust system to exhaust an atmosphere from the processing chamber;
at least a pair of electrodes made of flexible member extending in a stacking direction of the substrates to activate the processing gas; and
protecting tubes to accommodate the electrodes therein, wherein
each of the protecting tubes is provided with a bent portion at a higher position than an uppermost substrate, and a tip end of each of the electrodes is located on a tip end side of each of the protecting tubes over the bent portion.
2. The substrate processing apparatus according to claim 1 , wherein
the bent portion of each of the protecting tubes has one curvature portion, and each of the electrodes extends to the tip end side of each of the protecting tubes along the curvature portion.
3. The substrate processing apparatus according to claim 1 , wherein
the bent portion of each of the protecting tubes has a plurality of curvature portions, and each of the electrodes extends to the tip end side of each of the protecting tubes along the plurality of curvature portions.
4. The substrate processing apparatus according to claim 3 , wherein
the bent portion of each of the protecting tubes has two curvature portions, and each of the electrodes extends to the tip end side of each of the protecting tubes along the two curvature portions.
5. The substrate processing apparatus according to claim 1 , wherein
each of the protecting tubes includes a tip end and a lower end, the tip end is a closed end, and the lower end is an end for inserting each of the electrodes.
6. The substrate processing apparatus according to claim 1 , wherein
each of the electrodes has such a structure that at least a center core is incorporated inside a braided electrode.
7. A substrate processing apparatus, comprising:
a processing tube;
a support section to support a plurality of substrates in such a way that the substrate are vertically stacked in the processing tube;
a gas supply system to supply processing gas into the processing tube;
an exhaust system to exhaust an atmosphere from the processing tube;
at least a pair of electrodes made of flexible member extending in a stacking direction of the substrates; and
protecting tubes disposed inside the processing tube to accommodate the electrodes therein, wherein
each of the protecting tubes is provided with a bent portion at a higher position than an uppermost substrate supported by the support section, and a tip end of each of the electrodes extends to a tip end side of each of the protecting tubes along the bent portion.
8. The substrate processing apparatus according to claim 7 , wherein each of the electrodes has such a structure that at least a center core is incorporated inside a braided electrode.
9. The substrate processing apparatus according to claim 6 , wherein
the bent portion of each of the protecting tubes has one curvature portion, and each of the electrodes extends to the tip end side of each of the protecting tubes along the curvature portion.
10. The substrate processing apparatus according to claim 6 , wherein
the bent portion of each of the protecting tubes has a plurality of curvature portions, and each of the electrodes extends to the tip end side of each of the protecting tubes along the plurality of curvature portions.
11. The substrate processing apparatus according to claim 10 , wherein
the bent portion of each of the protecting tubes has two curvature portions, and each of the electrodes extends to the tip end side of each of the protecting tubes along the two curvature portions.
12. The substrate processing apparatus according to claim 6 , wherein
each of the protecting tubes includes a tip end and a lower end, the tip end is a closed end, and the lower end is an end for inserting each of the electrodes.
13. The substrate processing apparatus according to claim 8 , wherein
the bent portion of each of the protecting tubes has one curvature portion, and each of the electrodes extends to the tip end side of each of the protecting tubes along the curvature portion.
14. The substrate processing apparatus according to claim 8 , wherein
the bent portion of each of the protecting tubes has a plurality of curvature portions, and each of the electrodes extends to the tip end side of each of the protecting tubes along the plurality of curvature portions.
15. The substrate processing apparatus according to claim 14 , wherein
the bent portion of each of the protecting tubes has two curvature portions, and each of the electrodes extends to the tip end side of each of the protecting tubes along the two curvature portions.
16. The substrate processing apparatus according to claim 8 , wherein
each of the protecting tubes includes a tip end and a lower end, the tip end is a closed end, and the lower end is an end for inserting each of the electrodes.