Method of manufacturing a semiconductor device
View Patent ↗The invention aims to provide substrate treatment equipment that can automatically collect a substrate in a normal condition without needing manual operation. The equipment includes a substrate holder for holding substrates in a multistage manner and a substrate transfer unit for transferring the substrates into the substrate holder, wherein a substrate holding condition of the substrate holder is sensed by a sensing section. The sensing section has photo-sensors, and sensing waveforms sensed by the photo-sensors are compared with a normal waveform. A control section is provided, which controls a substrate transfer unit such that substrates other than at least a substrate that was determined to be abnormal are transferred by the unit.
1. A manufacturing method of a semiconductor device, comprising:
inserting a substrate holder on which substrates are held in a multistage manner in a substantially vertical direction into a substrate treatment chamber,
performing heat treatment to the substrates in the substrate treatment chamber,
sensing a holding condition of the substrates held in the substrate holder, and
transferring substrates other than a substrate determined to be abnormal and at least one of the substrates contacting the substrate determined to be abnormal in the substrate holder by a substrate transfer unit.
2. A transferring method of a substrate comprising:
inserting a substrate holder on which substrates are held in a multistage manner in a substantially vertical direction into a substrate treatment chamber,
performing heat treatment to the substrates in the substrate treatment chamber,
sensing a holding condition of the substrates held in the substrate holder, and
transferring substrates other than a substrate determined to be abnormal and at least one of the substrates contacting the substrate determined to be abnormal in the substrate holder by a substrate transfer unit.
3. A manufacturing method of a semiconductor device according to claim 1 , wherein the transferring substrates occurs after the sensing the holding condition of the substrates.
4. A transferring method of a substrate according to claim 2 , wherein the transferring substrates occurs after the sensing the holding condition of the substrates.