Substrate processing apparatus and substrate processing method
View Patent ↗A substrate processing apparatus detects malfunction of mechanisms in MFC. An inert gas supply line, a first shut-off valve shutting off the inert gas supply, a process gas supply line, and a second shut-off valve shutting off the process gas supply are installed upstream of the MFC. A gas supply pipe connected to a process chamber, a third shut-off valve shutting off gas supply to the gas supply pipe, an exhaust vent line which is exhaustible, and a fourth shut-off valve shutting off gas supply to the exhaust vent line are installed downstream of the MFC. A main control unit determines that the MFC is abnormal if a transition time exceeds a previously set time when the MFC transitions from a closed state to an opened state while the shut-off valves are in a closed state.
1. A substrate processing apparatus capable of detecting a malfunction thereof, comprising:
a process chamber for processing a substrate;
a flow rate control unit for controlling a flow rate of a gas supplied into the process chamber;
opening-closing valves installed at an upstream side and a downstream side of the flow rate control unit; and
a determination unit for determining the flow rate control unit is malfunctioning when a transition time from a closed state of the flow rate control unit to an opened state of the flow rate control unit, with all of the opening-closing valves closed, exceeds a predefined time.
2. A method for detecting a malfunction of a substrate processing apparatus, the substrate processing apparatus comprising a process chamber, a flow rate control unit, and opening-closing valves installed at an upstream side and a downstream side of the flow rate control unit, the method comprising:
processing, by the process chamber, a substrate;
controlling the flow rate control unit to transition from a closed state to an opened state, with all of the opening-closing valves closed;
determining that the flow rate control unit is malfunctioning when a transition time from the closed state to the opened state exceeds a predefined time; and
determining that the flow rate control unit is functioning normally when the transition time is within the predefined time.