Substrate processing method and substrate processing apparatus

1. A manufacturing method of a semiconductor device comprising:

generating hydrogen plasma by plasma excitation of hydrogen gas and processing a surface of a substrate on which a silicon film and a metal film are exposed with the hydrogen plasma; and

generating mixed plasma by plasma excitation of a mixed gas of hydrogen gas and oxygen-containing gas and oxidizing the silicon film by exposing the silicon film and the metal film to the mixed plasma to obtain the substrate on which the metal film and the oxidized silicon film are formed.

2. The manufacturing method of claim 1 , wherein the oxygen-containing gas is at least one selected from the group consisting of oxygen gas (O 2 ), nitrous oxide gas (N 2 O), and nitric oxide (NO).

3. The manufacturing method of claim 1 , wherein

the hydrogen plasma is generated by plasma excitation of hydrogen gas supplied in a processing chamber where the substrate is processed, and

the mixed plasma is generated by plasma excitation of the mixed gas supplied in the processing chamber.

4. The manufacturing method of claim 3 , wherein hydrogen gas is continuously supplied into the processing chamber while plasma excitation of gas in the processing chamber is performed.

5. The manufacturing method of claim 4 , wherein, in generating the mixed plasma, the oxygen-containing gas is gradually added to the hydrogen gas atmosphere in the processing chamber.

6. The manufacturing method of claim 1 , wherein

the plasma excitation of the hydrogen gas is caused by plasma discharge of the hydrogen as in the processing chamber, and

the plasma excitation of the mixed gas is caused by plasma discharge of the mixed gas in the processing chamber.

7. The manufacturing method of claim 6 , wherein the hydrogen gas is continuously supplied in the processing chamber while the plasma discharge continues.

8. The manufacturing method of claim 7 , wherein, in generating the mixed plasma, the oxygen-containing gas is gradually added to the hydrogen gas atmosphere in the processing chamber.

9. A manufacturing method comprising (a) through (f) in the following order:

(a) loading a substrate on which a silicon film and a metal film are exposed in a processing chamber;

(b) starting a supply of hydrogen gas to the processing chamber where the substrate is placed;

(c) starting plasma excitation of the hydrogen gas in the processing chamber to generate a hydrogen plasma for processing the surface of the substrate;

(d) starting a supply of oxygen-containing gas to the processing chamber to generate a mixed plasma by exciting a mixed gas of the hydrogen gas and the oxygen-containing gas, and oxidizing the silicon film by exposing the silicon film and the metal film to the mixed plasma;

(e) stopping plasma excitation in the processing chamber; and

(f) unloading the substrate on which the metal film and the oxidized silicon film are formed from the processing chamber.

10. The manufacturing method of claim 9 , further comprising (g):

(g) between the steps (d) and (e), stopping the supply of the oxygen-containing gas to the processing chamber.

11. The manufacturing method of claim 9 , further comprising (h):

(h) between (e) and (f), stopping the supply of hydrogen gas to the processing chamber.

12. The manufacturing method of claim 10 , further comprising (i):

(i) between (e) and (f), stopping the supply of hydrogen gas to the processing chamber.

13. The manufacturing method of claim 9 , wherein the oxygen-containing gas is at least one selected from the group consisting of oxygen gas (O 2 ), nitrous oxide gas (N 2 O), and nitric oxide (NO).