Patent Assignment
Reel/Frame 013702/0159
Assignment Assigning 50% of Rights
Recorded: 2003-01-28
Received: 2003-01-31
Pages: 3
Assignor
NEC CORPORATION
Executed: 2003-01-10
Assignee
NEC ELECTRONICS CORPORATION
1753 SHIMONUMABE, NAKAHARA-KU, KAWASAKI, KANAGAWA 211-8668, JPX, JAPAN
Covered Properties
(7)
Method of Reducing Pattern Distortions During Imprint Lithography Processes
Application:
10/293,223 →
Electronically-Controlled Locker System
Application:
10/075,694 →
Clock Synchronization Semiconductor Memory Device
Application:
10/052,191 →
Structure and Manufacturing Method of Semiconductor Device Having Uneven Surface at Memory Cell Capacitor Part
Application:
10/010,421 →
Semiconductor Memory Device
Application:
09/783,109 →
Semiconductor Memory Device Having a Rebundant Block and Reduced Power Consumption
Application:
09/767,303 →
Structure and Manufacturing Method of Semiconductor Device Having Uneven Surface at Memory Cell Capacitor Part
Application:
09/761,364 →