IP Library › Assignment 013749/0001
Patent Assignment
Reel/Frame 013749/0001

Assignment of Assignor's Interest

Recorded: 2003-02-06 Pages: 2
Assignors
YASUI, NAOKI
Executed: 2003-01-21
SUMIYA, MASAHIRO
Executed: 2003-01-21
TAMURA, HITOSHI
Executed: 2003-01-23
WATANABE, SEIICHI
Executed: 2003-01-21
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-14, NISHI SHIMBASHI, MINATO-KU, TOKYO 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus
Patent: 7,169,255 →
Application: 10/358,894 →
Publication: US 2003/0155075
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →