Patent Assignment
Reel/Frame 013912/0565
Assignment of Assignor's Interest
Recorded: 2003-03-25
Pages: 3
Assignee
W.C. HERAEUS GMBH & CO. KG
HERAEUSSTRASSE 12-14, DE-63450 HANAU, GERMANY
Covered Property
(1)
Sputtering target for depositing silicon layers in their nitride or oxide form and process for its preparation
Application:
10/396,148 →
Publication:
US 2003/0183508