IP Library Assignment 014385/0994
Patent Assignment
Reel/Frame 014385/0994

Assignment of Assignor's Interest

Recorded: 2003-08-13 Pages: 2
Assignors
OKAZAKI, TSUTOMU
Executed: 2003-02-28
OKADA, DAISUKE
Executed: 2003-02-28
IKEDA, YOSHIHIRO
Executed: 2003-03-03
TSUKAMOTO, KEISUKE
Executed: 2003-04-14
FUKUMURA, TATSUYA
Executed: 2003-02-28
SHUKURI, SHOJI
Executed: 2003-04-08
HARAGUCHI, KEIICHI
Executed: 2003-03-12
KISHI, KOJI
Executed: 2003-04-04
Assignee
HITACHI, LTD.
6, KANDA SURUGADAI, 4-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Method of Manufacturing a Semiconductor Device Having Trenches for Isolation and Capacitor Formation Trenches
Patent: 7,015,090 →
Application: 10/408,353 →
Publication: US 2004/0038492
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 26, 2003
From: HITACHI, LTD.
To: RENESAS TECHNOLOGY CORPORATION
Reel/Frame 014569/0585 →
Merger Jul 30, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025204/0512 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →