IP Library Assignment 014403/0775
Patent Assignment
Reel/Frame 014403/0775

Assignment of Assignor's Interest

Recorded: 2003-08-18 Pages: 2
Assignors
YASUDA, HIROSHI
Executed: 2003-07-22
YAMADA, AKIO
Executed: 2003-07-22
YABE, TAKAYUKI
Executed: 2003-07-22
Assignee
ADVANTEST CORPORATION
1-32-1, ASAHI-CHO, NERIMA-KU, TOKYO, 179-0071, JAPAN
Covered Property (1)
Electron Beam Exposure Apparatus, Electron Beam Method, Semiconductor Device Manufacturing Method, Mask, and Mask Manufacturing Method
Patent: 6,903,355 →
Application: 10/424,888 →
Publication: US 2004/0000649
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address Dec 18, 2018
From: ADVANTEST CORPORATION
To: ADVANTEST CORPORATION
Reel/Frame 047987/0626 →