IP Library Assignment 014541/0153
Patent Assignment
Reel/Frame 014541/0153

Assignment of Assignor's Interest

Recorded: 2003-09-29 Pages: 2
Assignors
HATTORI, TAKASHI
Executed: 2001-10-26
GOTOH, YASUKO
Executed: 2001-10-30
SATOH, HIDETOSHI
Executed: 2001-11-12
TANAKA, TOSHIHIKO
Executed: 2001-10-26
SHIRAISHI, HIROSHI
Executed: 2001-10-26
Assignee
HITACHI, LTD.
6, KANDA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Photomask, the Manufacturing Method, a Patterning Method, and a Semiconductor Device Manufacturing Method
Patent: 6,927,002 →
Application: 10/026,973 →
Publication: US 2002/0086223
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 15, 2003
From: HITACHI, LTD.
To: RENESAS TECHNOLOGY CORPORATION
Reel/Frame 014569/0186 →
Merger and Change of Name Sep 9, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024953/0672 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →