Patent Assignment
Reel/Frame 014645/0521
Assignment of Assignor's Interest
Recorded: 2003-10-31
Received: 2003-11-04
Pages: 2
Assignor
KIRCHHOFF, MARKUS
Executed: 2001-09-18
Assignee
INFINEON TECHNOLOGIES AG
ST. -MARTIN-STRASSE 53, MUENCHEN, DEX, 81669, GERMANY
Covered Property
(1)
Method for Forming a Trench in a Semiconductor Substrate
Application:
09/917,554 →