Patent Assignment
Reel/Frame 014682/0548
Assignment of Assignor's Interest
Recorded: 2004-06-02
Pages: 4
Assignors
GHYSELEN, BRUNO
Executed: 2004-02-24
MAZURE, CARLOS
Executed: 2004-02-18
ARENE, EMMANUEL
Executed: 2004-02-25
Assignee
S.O.I. TEC SILICON ON INSULATOR TECHNOLOGIES S.A.
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES 38190, BERNIN, FRANCE
Covered Property
(1)
Method for forming a relaxed or pseudo-relaxed useful layer on a substrate
Application:
10/784,017 →
Publication:
US 2004/0192067
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.