IP Library Assignment 014706/0233
Patent Assignment
Reel/Frame 014706/0233

Assignment of Assignor's Interest

Recorded: 2003-11-12 Pages: 2
Assignors
FUJIYOSHI, KOUJI
Executed: 2003-10-08
TAKIGAWA, MASAMI
Executed: 2003-10-08
Assignee
ADVANTEST CORPORATION
1-32, ASAHI-CHO 1-CHOME, NERIMA-KU, TOKYO, 179-0071, JAPAN
Covered Property (1)
Electron Beam Exposure Apparatus, Electron Beam Exposing Method, Semiconductor Element Manufacturing Method, and Pattern Error Detection Method
Patent: 7,041,512 →
Application: 10/712,594 →
Publication: US 2004/0104357
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address Dec 18, 2018
From: ADVANTEST CORPORATION
To: ADVANTEST CORPORATION
Reel/Frame 047987/0626 →