IP Library Assignment 014796/0069
Patent Assignment
Reel/Frame 014796/0069

Assignment of Assignor's Interest

Recorded: 2004-06-29 Pages: 3
Assignors
LEE, DEOK-HYUNG
Executed: 2004-06-08
CHOI, SI-YOUNG
Executed: 2004-06-08
LEE, BYEONG-CHAN
Executed: 2004-06-08
SON, YOON-HOON
Executed: 2004-06-08
JUNG, IN-SOO
Executed: 2004-06-08
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 MAETAN-DONG, YEONGTON-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Methods for Fabricating Fin Field Effect Transistors Using a Protective Layer to Reduce Etching Damage
Patent: 7,074,662 →
Application: 10/869,764 →
Publication: US 2005/0019993