Patent Assignment
Reel/Frame 014983/0616
Assignment of Assignor's Interest
Recorded: 2004-02-12
Pages: 4
Assignors
O'MEARA, DAVID L.
Executed: 2003-10-24
WAJDA, CORY
Executed: 2003-10-24
TAKAHASHI, TSUYOSHI
Executed: 2003-11-18
Assignee
TOKYO ELECTRON LIMITED
3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO 107, JAPAN
Covered Property
(1)
Interfacial Oxidation Process for High-K Gate Dielectric Process Integration
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.