Patent Assignment
Reel/Frame 015011/0268
Assignment of Assignor's Interest
Recorded: 2004-02-19
Pages: 3
Assignors
PARK, JAE-EUN
Executed: 2004-02-12
CHU, KANG-SOO
Executed: 2004-02-12
LEE, JOO-WON
Executed: 2004-02-12
YANG, JONG-HO
Executed: 2004-02-12
Assignee
SAMSUNG ELECTRONICS, CO., LTD.
416, MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property
(1)
Method for Forming Silicon Dioxide Film Using Siloxane