Patent Assignment
Reel/Frame 015026/0214
Assignment of Assignor's Interest
Recorded: 2004-02-27
Pages: 3
Assignors
ONO, HARUHITO
Executed: 2004-02-13
AKAIKE, MASATAKE
Executed: 2004-02-13
TAMAMORI, KENJI
Executed: 2004-02-16
HIROSE, FUTOSHI
Executed: 2004-02-13
KOYAMA, YASUSHI
Executed: 2004-02-13
TERASAKI, ATSUNORI
Executed: 2004-02-13
NAGAE, KEN-ICHI
Executed: 2004-02-13
NAKAYAMA, YOSHINORI
Executed: 2004-02-23
Assignees
CANON KABUSHIKI KAISHA
3-30-2, SHIMOMARUKO 3-CHOME, OHTA-KU, TOKYO, JAPAN
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Deflector, Method of Manufacturing Deflector, and Charged Particle Beam Exposure Apparatus Using Deflector
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.