IP Library › Assignment 015061/0378
Patent Assignment
Reel/Frame 015061/0378

Assignment of Assignor's Interest

Recorded: 2004-02-05 Pages: 4
Assignors
LEE, BYEONG-CHAN
Executed: 2004-01-13
CHOI, SI-YOUNG
Executed: 2004-01-13
YOO, JONG-RYEOL
Executed: 2004-01-13
LEE, DEOK-HYUNG
Executed: 2004-01-13
JUNG, IN-SOO
Executed: 2004-01-13
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Methods for Forming Double Gate Electrodes Using Tunnel and Trench
Patent: 6,900,102 →
Application: 10/773,022 →
Publication: US 2004/0157396