Patent Assignment
Reel/Frame 015068/0757
Assignment of Assignor's Interest
Recorded: 2004-03-09
Pages: 2
Assignors
YASUI, NAOKI
Executed: 2004-03-01
WATANABE, SEIICHI
Executed: 2004-03-01
SUMIYA, MASAHIRO
Executed: 2004-03-01
TAMURA, HITOSHI
Executed: 2004-03-01
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-12, NISHI SHIMBASHI, MINATO-KU, TOKYO 105-8717, JAPAN
Covered Property
(1)
Plasma Processing Apparatus Having High Frequency Power Source with Sag Compensation Function and Plasma Processing Method