Assignment of Assignor's Interest

Recorded: 2004-03-11 Pages: 3

Assignor

FUKIAGE, NORIAKI

Executed: 2003-11-13

Assignee

TOKYO ELECTRON LIMITED

3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO 107, JAPAN

Covered Property (1)

Method of Improving Post-Develop Photoresist Profile on a Deposited Dielectric Film

Patent: 7,611,758 →

Application: 10/702,049 →

Publication: US 2005/0100683

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.