IP Library › Assignment 015117/0821
Patent Assignment
Reel/Frame 015117/0821

Assignment of Assignor's Interest

Recorded: 2004-09-13 Pages: 5
Assignors
OHDAIRA, TOSHIYUKI
Executed: 2004-05-17
SHIOYA, YOSHIMI
Executed: 2004-05-17
Assignees
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
3-1, KASUMIGASEKI 1-CHOME, CHIYODA-KU, TOKYO, 100-8921, JAPAN
SEMICONDUCTOR PROCESS LABORATORY CO., LTD.
APPEX BUILDING, 4F, 717-30, FUTAMATA, ICHIKAWA-SHI, CHIBA, 272-0001, JAPAN
Covered Property (1)
Low Dielectric Constant Insulating Film and Method of Forming the Same
Patent: 7,132,171 →
Application: 10/847,670 →
Publication: US 2005/0003213
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 10, 2009
From: SEMICONDUCTOR PROCESS LABORATORY CO., LTD.
To: KANKEN TECHNO CO., LTD.
Reel/Frame 022390/0985 →