IP Library Assignment 015200/0875
Patent Assignment
Reel/Frame 015200/0875

Assignment of Assignor's Interest

Recorded: 2004-04-12 Pages: 15
Assignors
HASHIMOTO, SHINICHI
Executed: 2003-02-19
YODA, HARUO
Executed: 2004-02-19
MURAKI, MASATO
Executed: 2004-03-23
Assignees
ADVANTEST CORPORATION
1-32, ASHAHI-CHO 1-CHOME, NERIMA-KU, TOKYO, JAPAN
CANON KABUSHIKI KAISHA
30-2, 3-CHOME, SHIMOMARUKO, OHTA-KU, TOKYO, JAPAN
HITACHI, LTD.
6, KANDA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Electron Beam Exposure Apparatus, Electron Beam Exposure Apparatus Calibration Method, and Semiconductor Element Manufacturing Method
Patent: 6,917,045 →
Application: 10/672,435 →
Publication: US 2004/0061065
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address Dec 18, 2018
From: ADVANTEST CORPORATION
To: ADVANTEST CORPORATION
Reel/Frame 047987/0626 →