IP Library Assignment 015303/0210
Patent Assignment
Reel/Frame 015303/0210

Assignment of Assignor's Interest

Recorded: 2004-10-28 Pages: 3
Assignors
CHA, YONG-WON
Executed: 2004-08-06
NA, KYU-TAE
Executed: 2004-08-06
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Methods of Filling Trenches Using High-Density Plasma Deposition (Hdp)
Patent: 7,056,827 →
Application: 10/917,659 →
Publication: US 2005/0037610