Patent Assignment
Reel/Frame 015390/0673
Assignment of Assignor's Interest
Recorded: 2004-11-18
Pages: 4
Assignors
NIIMI, HIROAKI
Executed: 2004-10-23
COLOMBO, LUIGI
Executed: 2004-10-24
SHIMOMURA, KOJI
Executed: 2004-10-26
SUGAWARA, TAKUYA
Executed: 2004-10-27
MATSUDO, TATSUO
Executed: 2004-11-04
Assignees
TOKYO ELECTRON LIMITED
TBS BROADCAST CENTER, 3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO 107, JAPAN
TEXAS INSTRUMENTS INCORPORATED
7839 CHURCHILL WAY, MS 3999, DALLAS, TEXAS, 75251
Covered Property
(1)
Method and System for Modifying a Gate Dielectric Stack Containing a High-K Layer Using Plasma Processing
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.
Corrective Document
Jun 6, 2005
From: NIIMI, HIROAKI; COLOMBO, LUIGI; SHIMOMURA, KOJI; SUGAWARA, TATUYA
To: TOKYO ELECTRON LIMITED; TEXAS INSTRUMENTS INCORPORATED
Reel/Frame 016305/0877 →
To Correct Execution Date on Reel 015390 Frame 0673.
Jul 12, 2005
From: NIIMI, HIROAKI; COLOMBO, LUIGI; SHIMOMURA, KOJI; SUGAWARA, TAKUYA
To: TOKYO ELECTRON LIMITED; TEXAS INSTRUMENTS INCORPORATED
Reel/Frame 016509/0889 →