Patent Assignment
Reel/Frame 015404/0584
Assignment of Assignor's Interest
Recorded: 2004-05-25
Pages: 4
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO 100-0004, JAPAN
Covered Property
(1)
Resist Lower Layer Film Material and Method for Forming a Pattern