IP Library Assignment 015662/0547
Patent Assignment
Reel/Frame 015662/0547

Assignment of Assignor's Interest

Recorded: 2004-08-09 Pages: 9
Assignors
MALONEY, GERARD S.
Executed: 1999-09-03
PRICE, JASON
Executed: 1999-10-08
CHIN, SCOTT
Executed: 1999-09-03
KAJIWARA, JIRO
Executed: 1999-09-03
CHARIF, MALEK
Executed: 1999-10-12
Assignee
MITSUBISHI MATERIALS CORPORATION
1-5-1 OHTEMACHI, CHIYODA-KU, TOKYO, 100-8117, JAPAN
Covered Property (1)
Apparatus for Chemical-Mechanical Polishing (Cmp) Head Having Direct Pneumatic Wafer Polishing Pressure
Patent: 7,029,382 →
Application: 10/027,935 →
Publication: US 2002/0077045
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 9, 2004
From: MITSUBISHI MATERIALS CORPORATION
To: EBARA CORPORATION
Reel/Frame 015661/0092 →