IP Library Assignment 015782/0279
Patent Assignment
Reel/Frame 015782/0279

Assignment of Assignor's Interest

Recorded: 2004-09-08 Pages: 3
Assignors
DOCZY, MARK L.
Executed: 2004-08-18
BRASK, JUSTIN K.
Executed: 2004-08-17
KAVALIEROS, JACK
Executed: 2004-08-17
SHAH, UDAY
Executed: 2004-08-17
METZ, MATTHEW V.
Executed: 2004-08-17
DATTA, SUMAN
Executed: 2004-08-17
NAGISETTY, RAMUNE
Executed: 2004-08-17
CHAU, ROBERT S.
Executed: 2004-08-31
Assignee
INTEL CORPORATION
2200 MISSION COLLEGE BOULEVARD, SANTA CLARA, CALIFORNIA, 95052
Covered Property (1)
Method for Making a Semiconductor Device Having a High-K Gate Dielectric Layer and a Metal Gate Electrode
Patent: 7,390,709 →
Application: 10/937,195 →
Publication: US 2006/0051924
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 15, 2022
From: INTEL CORPORATION
To: TAHOE RESEARCH, LTD.
Reel/Frame 061175/0176 →