Patent Assignment
Reel/Frame 015821/0439
Assignment of Assignor's Interest
Recorded: 2004-09-20
Pages: 4
Assignee
TOKYO ELECTRON LIMITED
3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO 107-8481, JAPAN
Covered Property
(1)
Substrate Processing Apparatus and Method, High Speed Rotary Valve and Cleaning Method