IP Library › Assignment 015823/0512
Patent Assignment
Reel/Frame 015823/0512

Assignment of Assignor's Interest

Recorded: 2004-03-17 Pages: 4
Assignors
WIELAND, MARCO JAN-JACO
Executed: 2004-01-19
KAMPHERBEEK, BERT JAN
Executed: 2004-01-19
VAN VEEN, ALEXANDER HENDRIK
Executed: 2004-01-21
KRUIT, PIETER
Executed: 2004-01-21
Assignee
MAPPER LITHOGRAPHY IP B.V.
LORENTZWEG, CJ DELFT, 2628, NETHERLANDS
Covered Property (1)
Electron Beam Exposure System
Patent: 6,897,458 →
Application: 10/699,246 →
Publication: US 2004/0141169
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Court Appointment May 7, 2019
From: MAPPER LITHOGRAPHY HOLDING B.V.; MAPPER LITHOGRAPHY IP B.V.; MAPPER LITHOGRAPHY B.V.
To: WITTEKAMP, J.J.
Reel/Frame 049104/0734 →
Assignment of Assignor's Interest May 7, 2019
From: WITTEKAMP, J.J.
To: ASML NETHERLANDS B.V.
Reel/Frame 049296/0606 →