Patent Assignment
Reel/Frame 049296/0606
Assignment of Assignor's Interest
Recorded: 2019-05-07
Pages: 63
Assignor
WITTEKAMP, J.J.
Executed: 2019-02-06
Assignee
ASML NETHERLANDS B.V.
DE RUN 6501, DR VELDHOVEN, 5504, NETHERLANDS
Covered Properties
(297)
Lithography System
Patent:
6,335,783 →
Application:
09/424,575 →
Lithography System Comprising a Converter Plate and Means for Protecting the Converter Plate
Direct Write Lithography System
Field emission photo-cathode array for lithography system and lithography system provided with such an array
Application:
10/392,228 →
Publication:
US 2003/0178583
Stage Device for a Vacuum Chamber
Adjustment in a Mapper System
Lithography System
Electron Beam Exposure System
System, Method and Apparatus for Multi-Beam Lithography Including a Dispenser Cathode for Homogeneous Electron Emission
Apparatus for Generating a Plurality of Beamlets
Charged Particle Beamlet Exposure System
Modulator Circuitry
Charged Particle Beam Exposure System
Electron Beam Exposure System
Direct Write Lithography System
Optical Switching in Lithography System
Reliability in a Maskless Lithography System
Lithography System and Projection Method
Lithography System, Sensor and Measuring Method
Apparatus for Generating a Plurality of Beamlets
Apparatus for Generating a Plurality of Beamlets
Apparatus for Generating a Plurality of Beamlets
Apparatus for Generating a Plurality of Beamlets
System, Method and Apparatus for Multi-Beam Lithography Including a Dispenser Cathode for Homogeneous Electron Emission
Optical Switching in a Lithography System
Lithography System and Projection Method
Lithography System, Method of Heat Dissipation and Frame
Multiple Beam Charged Particle Optical System
Lithography System
Optical Switching in Lithography System
Application:
12/041,634 →
Publication:
US 2008/0158536
Optical Switching in Lithography System
Application:
12/041,635 →
Publication:
US 2008/0158537
Electron Beam Exposure System
Patent:
44,240 →
Application:
12/189,817 →
Lithography system, method of clamping and wafer table
Charged Particle Beam Exposure System
Projection Lens Arrangement
Projection Lens Arrangement
Application:
12/393,050 →
Publication:
US 2009/0261267
Charged Particle Beam Lithography System and Target Positioning Device
Lithography System
Simultaneous Measurement of Beams in Lithography System
Method of Clamping a Substrate and Clamp Preparation Unit Using Capillary Clamping Force
Charged Particle Lithography Apparatus and Method of Generating Vacuum in a Vacuum Chamber
Application:
12/708,544 →
Publication:
US 2011/0042579
Charged Particle Lithography Apparatus and Method of Generating Vacuum in a Vacuum Chamber
Preparation Unit for Lithography Machine
Method and Arrangement for Realizing a Vacuum in a Vacuum Chamber
Substrate Support Structure, Clamp Preparation Unit, and Lithography System
Lithography Machine and Substrate Handling Arrangement
Application:
12/709,647 →
Publication:
US 2011/0049393
Lithography System and Projection Method
System, Method and Apparatus for Multi-Beam Lithography Including a Dispenser Cathode for Homogeneous Electron Emission
Charged Particle Optical System Comprising an Electrostatic Deflector
Multiple Beam Charged Particle Optical System
High Voltage Shielding Arrangement of a Charged Particle Lithography System
Enhanced Integrity Projection Lens Assembly
Projection Lens Arrangement
Beamlet Blanker Arrangement
Modulation device and charged particle multi-beamlet lithography system using the same
Charged Particle Multi-Beamlet Lithography System, Modulation Device , and Method of Manufacturing Thereof
Charged particle multi-beamlet lithography system with modulation device
Method of and System for Exposing a Target
Support and Positioning Structure, Semiconductor Equipment System and Method for Positioning
Capacitive Sensing System
Capacitive Sensing System with Differential Pairs
Exposure Method
Application:
12/977,346 →
Publication:
US 2011/0261344
Integrated Sensor System
Imaging System
Lithography System with Lens Rotation
Application:
13/010,658 →
Publication:
US 2011/0174985
Substrate Support Structure, Clamp Preparation Unit, and Lithography System
Multiple Beam Charged Particle Optical System
Lithography System, Sensor, Converter Element and Method of Manufacture
Multiple Beam Charged Particle Optical System
Electrostatic Lens Structure
System, Method and Apparatus for Multi-Beam Lithography Including a Dispenser Cathode for Homogeneous Electron Emission
Lithography System Arranged on a Foundation, and Method for Arranging a Lithography System on Said Foundation
Application:
13/237,797 →
Publication:
US 2012/0069317
Lithography System, Modulation Device and Method of Manufacturing a Fiber Fixation Substrate
Modulation Device and Charged Particle Multi-Beamlet Lithography System Using the Same
Optical Switching in a Lithography System
Application:
13/284,634 →
Publication:
US 2012/0043457
Data Path for Lithography Apparatus
Data Path for Lithography Apparatus
Method of Generating a Two-Level Pattern for Lithographic Processing and Pattern Generator Using the Same
Dual Pass Scanning
Pattern Data Conversion for Lithography System
Method for Determining a Distance Between Two Beamlets in a Multi-Beamlet Exposure Apparatus
Lithography system and method of refracting
Charged Particle Lithography System with Aperture Array Cooling
Charged Particle Lithography System with Intermediate Chamber
Charged Particle Beam Modulator
Charged Particle Beam Lithography System and Target Positioning Device
Projection Lens Arrangement
Lithography System and Method of Processing Substrates in Such a Lithography System
Electron Beam Exposure System
Patent:
44,908 →
Application:
13/343,036 →
Electron Beam Exposure System
Patent:
45,049 →
Application:
13/343,038 →
System for Magnetic Shielding
Projection Lens Arrangement
Direct Write Lithography System
Lithography System with Differential Interferometer Module
Interferometer Module
Alignment of an Interferometer Module for Use in an Exposure Tool
Arrangement of Optical Fibers, and a Method of Forming Such Arrangement
Network architecture and protocol for cluster of lithography machines
Network Architecture for Lithography Machine Cluster
Position Determination in a Lithography System Using a Substrate Having a Partially Reflective Position Mark
Lithography System for Processing a Target, Such as a Wafer, a Method for Operating a Lithography System for Processing a Target, Such as a Wafer and a Substrate for Use in Such a Lithography System
Lithography System for Processing a Target, Such as a Wafer, and a Method for Operating a Lithography System for Processing a Target, Such as a Wafer
Charged Particle System Comprising a Manipulator Device for Manipulation of One or More Charged Particle Beams
Electro-Optical Element for Multiple Beam Alignment
Method of processing a substrate in a lithography system
Apparatus for Transferring a Substrate in a Lithography System
Multiple Beam Charged Particle Optical System
Lithography System for Processing at Least a Part of a Target
Method for splitting a pattern for use in a multi-beamlet lithography apparatus
Application:
13/474,744 →
Publication:
US 2013/0120724
Charged Particle Multi-Beam Apparatus Including a Manipulator Device for Manipulation of One or More Charged Particle Beams
Active Shield for Capacitive Measurement System
Current Measurement System
Lithography System and Method for Storing Positional Data of a Target
Support Structure for Wafer Table
Projection System with Flexible Coupling
Assembly and a Method for Lifting a Module of a Lithography System in a Vertical Direction and a Lithography System Comprising Such Assembly
Guidance for Target Processing Tool
Target Positioning Device, Method for Driving a Target Positioning Device, and a Lithography System Comprising Such a Target Positioning Device
Assembly for Providing an Aligned Stack of Two or More Modules and a Lithography System or a Microscopy System Comprising Such an Assembly
Lithography System and Projection Method
Patent:
45,552 →
Application:
13/689,665 →
Enhanced Integrity Projection Lens Assembly
Enhanced Integrity Projection Lens Assembly
Method and System for Realizing a Vacuum in a Vacuum Chamber
Lithography System, Sensor and Measuring Method
Patent:
45,206 →
Application:
13/738,947 →
Method of handling a substrate support structure in a lithography system
Method of and System for Exposing a Target
Charged particle multi-beamlet lithography system with modulation device
Projection Lens Arrangement
Charged Particle Lithography System with Intermediate Chamber
Capacitive Sensing System
Lithography System, Method of Clamping and Wafer Table
Lithography System, Method of Clamping and Wafer Table
Charged Particle Beam Lithography System and Target Positioning Device
Vibration Isolation Module and Substrate Processing System
Charged Particle Lithography System
Deflection Scan Speed Adjustment During Charged Particle Exposure
Method for Exposing a Wafer
Electrostatic Lens Structure
Patent:
46,452 →
Application:
14/302,522 →
Substrate Processing Apparatus
Vacuum Chamber with a Thick Aluminum Base Plate
Support Module for Lithography System
Method and Apparatus for Predicting a Growth Rate of Deposited Contaminants
Plasma Generator
Plasma Generator
Application:
14/348,071 →
Publication:
US 2014/0252953
Device for Spot Size Measurement at Wafer Level Using a Knife Edge and a Method for Manufacturing Such a Device
Charged Particle Lithography System with Alignment Sensor and Beam Measurement Sensor
Lithography System and Method for Processing a Target, Such as a Wafer
Arrangement and Method for Transporting Radicals
Modulation Device and Power Supply Arrangement
Charged particle lithography system and beam generator
Method for Determining a Beamlet Position and Method for Determining a Distance Between Two Beamlets in a Multi-Beamlet Exposure Apparatus
Multi-Axis Differential Interferometer
Drying apparatus for use in a lithography system
Lithography System, Sensor and Measuring Method
Patent:
48,046 →
Application:
14/469,544 →
Charged Particle Optical Device
Target Processing Unit
Multi-Electrode Electron Optics
Multi-Electrode Cooling Arrangement
Multi-Electrode Stack Arrangement
Cathode arrangement, electron gun, and lithography system comprising such electron gun
Cathode arrangement, electron gun, and lithography system comprising such electron gun
Charged Particle Lithography System with Sensor Assembly
Charged Particle Beam Lithography System and Target Positioning Device
Lithography System, Sensor, Converter Element and Method of Manufacture
Patent:
47,287 →
Application:
14/602,294 →
Electrical Charge Regulation for a Semiconductor Substrate During Charged Particle Beam Processing
Application:
14/602,318 →
Publication:
US 2015/0206740
Enhanced Stitching by Overlap Dose and Feature Reduction
Proximity Effect Correction in a Charged Particle Lithography System
Method of Determining a Position of a Substrate in a Lithography System, Substrate for Use in Such a Method, and Lithography System for Carrying Out Such Method.
Individual beam pattern placement verification in multiple beam lithography
Method for forming an optical fiber array
Enclosure for a Target Processing Machine
Interferometer Module
Network architecture and protocol for cluster of lithography machines
Cabinet for Electronic Equipment
Beam Grid Layout
Arrangement for transporting radicals
Apparatus for Transferring a Substrate in a Lithography System
Load Lock System and Method for Transferring Substrates in a Lithography System
Control System and Method for Lithography Apparatus
Target Processing Unit
Method and System for the Removal and/or Avoidance of Contamination in Charged Particle Beam Systems
Method and Encoding Device for Encoding a Sequence of M-Bit Pattern Words and Outputting a Frame Comprising Corresponding N-Bit Symbols
Method and Device for Generating a Decoded and Synchronized Output
Focusing Electrode for Cathode Arrangement, Electron Gun, and Lithography System Comprising Such Electron Gun
Substrate Holding Device, Method for Manufacturing Such a Device, and Use of Such a Device in a Lithography System
Patent:
9,829,804 →
Application:
15/222,705 →
Apparatus and Method for Processing or Imaging a Sample
Application:
15/222,708 →
Publication:
US 2018/0033586
Method and Arrangement for Handling and Processing Substrates
Method and Apparatus for Aligning Substrates on a Substrate Support Unit
Fabricating Unique Chips Using a Charged Particle Multi-Beamlet Lithography System
Fabricating Unique Chips Using a Charged Particle Multi-Beamlet Lithography System
Optical Fiber Feedthrough Device and Fiber Path Arrangement
Adjustment assembly and substrate exposure system comprising such an adjustment assembly
Secure Chips with Serial Numbers
Secure Chips with Serial Numbers
Vacuum Chamber Arrangement for Charged Particle Beam Generator
High voltage shielding and cooling in a charged particle beam generator
Lithography System with Differential Interferometer Module
Application:
15/620,699 →
Publication:
US 2017/0277043
Electrostatic Lens Structure
Application:
15/632,477 →
Publication:
US 2017/0309438
Substrate Processing Apparatus
Feedthrough Device and Signal Conductor Path Arrangement
Method and System for the Removal and/or Avoidance of Contamination in Charged Particle Beam Systems
Aberration Correction in Charged Particle System
Method for forming an optical fiber array
Patent:
48,287 →
Application:
16/150,286 →
Lithography system comprising a converter plate and means for protecting the converter plate-utility-provisional
Application:
60/312,169 →
Direct write lithography system - utility
Application:
60/365,843 →
Adjustment in a mapper system
Application:
60/390,834 →
Optical switching in a lithography system
Application:
60/421,464 →
Electron beam exposure system
Application:
60/422,758 →
Dispenser cathode
Application:
60/447,975 →
Avoidance of chromatic aberration
Application:
60/453,745 →
Charged-particle optical system
Application:
60/473,810 →
Modulator circuitry
Application:
60/491,475 →
Charged particle beam exposure system
Application:
60/572,287 →
Reliability in a maskless lithography system
Application:
60/702,561 →
Lithography system and projection method
Application:
60/717,856 →
Lithography system, sensor and measuring method
Application:
60/718,143 →
Lithography system and projection method
Application:
60/781,040 →
Multiple beam charged particle optical system
Application:
60/833,394 →
Lithography system, method of heat dissipation and frame
Application:
60/833,865 →
Lithography system, method of clamping and wafer table
Application:
60/959,531 →
Projection Lens Arrangement
Application:
61/031,573 →
Projection Lens Arrangement
Application:
61/031,594 →
Charged Particle Beam Lithography System and Target Positioning Device
Application:
61/089,744 →
Simultaneous Measurement of Beams in Lithography System
Application:
61/112,591 →
Method of Clamping, Substrate Support Structure, Clamp Preparation Unit, and Lithography System
Application:
61/154,411 →
Charged particle optical system comprising an electrostatic deflector
Application:
61/173,638 →
Multiple Beam Charged Particle Optical System
Application:
61/243,948 →
Projection Lens Assembly
Application:
61/250,336 →
High Voltage Shielding Arrangement
Application:
61/250,338 →
Maskless lithography system, electronic device, and manufacturing thereof
Application:
61/254,779 →
Support and Positioning Structure and Semiconductor Equipment System Therewith
Application:
61/287,657 →
Support and Positioning Structure and Semiconductor Equipment System Therewith
Application:
61/287,661 →
Capacitive Sensing System
Application:
61/291,411 →
Substrate Support Structure, Clamp Preparation Unit, and Lithography System
Application:
61/306,199 →
Method and Arrangement for Realizing a Vacuum in a Vacuum Chamber
Application:
61/306,333 →
Substrate Support Structure, Clamp Preparation Unit, and Lithography System
Application:
61/310,303 →
Method for Arranging a Lithography System on a Foundation, and Lithography System Arranged on Said Foundation
Application:
61/384,690 →
Modulation device and charged particle multi-beamlet lithography system using the same
Application:
61/406,675 →
Lithography Machine
Application:
61/413,396 →
Method for Determining a Distance Between Two Beamlets in a Multi-Beamlet Exposure Apparatus
Application:
61/414,459 →
Charged Particle Beam Modulator
Application:
61/414,544 →
Lithography system and method of refracting a diverging charged particle beam
Application:
61/414,594 →
Data Path with Redundancy for lithography apparatus
Application:
61/414,775 →
Charged Particle Multi-Beamlet Lithography System with Modulation Device
Application:
61/415,200 →
Lithography System
Application:
61/422,745 →
Isolated Aperture Array
Application:
61/443,466 →
Magnetic Shield
Application:
61/443,475 →
Optical Transmission System
Application:
61/477,228 →
Isolated Aperture Array
Application:
61/477,688 →
Control Architecture
Application:
61/478,117 →
Wafer Alignment System
Application:
61/478,126 →
Fiber Diode Coupling
Application:
61/479,263 →
Individual Beam Corrector
Application:
61/479,475 →
Column Alignment
Application:
61/480,152 →
Expose Method
Application:
61/480,163 →
Alignment Sensor
Application:
61/486,165 →
Alignment Sensor
Application:
61/486,167 →
Smart Boundary Stitching
Application:
61/487,465 →
Method for Splitting a Pattern for Use in a Multi-Beam Lithography Apparatus
Application:
61/488,882 →
Position Determination in a Lithography System Using a Substrate Having a Partially Reflective Position Mark
Application:
61/491,862 →
Charged Particle Beam Exposure Apparatus
Application:
61/491,865 →
Lithography System for Processing a Target, Such as a Wafer, and a Method for Operating a Lithography System for Processing a Target, Such as a Wafer
Application:
61/491,866 →
Lithography System for Processing a Target, Such as a Wafer, and a Method for Operating a Lithography System for Processing a Target, Such as a Wafer
Application:
61/491,867 →
Combined Alignment Systems
Application:
61/494,816 →
Active Shield for Capacitive Measurement System
Application:
61/503,555 →
Lithography System and Method for Storing Positional Data of a Target
Application:
61/506,581 →
Lithography System for Processing at Least a Part of a Target
Application:
61/510,886 →
Support structure for wafer table
Application:
61/532,584 →
Projection system with flexible coupling
Application:
61/532,636 →
Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly
Application:
61/533,286 →
Assembly and a method for lifting a module of a lithography system in a vertical direction and a lithography system comprising such assembly
Application:
61/533,321 →
Guidance for target processing tool
Application:
61/533,339 →
Target positioning device and a lithography system comprising such a target positioning device
Application:
61/533,398 →
Method for driving a target positioning device
Application:
61/533,404 →
Communication Protocol and Format
Application:
61/533,673 →
Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
Application:
61/547,217 →
Data Path for Lithography Apparatus
Application:
61/552,479 →
System for Magnetic Shielding
Application:
61/561,288 →
Charged particle optical device
Application:
61/874,394 →
Modular Projection Lens Assembly
Application:
61/875,016 →
Multi-Electrode Collimator
Application:
61/904,057 →
Sensor Camera System
Application:
61/921,002 →
Cathode arrangement, electron gun, and lithography system comprising such a electron gun
Application:
61/921,546 →
Charge Regulation for a Semiconductor Substrate During Charged Particle Beam Processing
Application:
61/930,345 →
Enhanced Stitching
Application:
61/942,636 →
Proximity effect correction in a charged particle lithography system
Application:
61/942,676 →
Electrical Charge Regulation for a Semiconductor Substrate During Charged Particle Beam Processing
Application:
61/969,322 →
Enclosure for a Target Processing Machine
Application:
61/990,034 →
Apparatus and Method for Transferring Substrates in a Lithography System
Application:
62/079,598 →
Method and System for Fabricating Unique Chips Using a Charged Particle Multi-Beamlet Lithography System
Application:
62/385,049 →
Fabricating Unique Chips Using a Charged Particle Multi-Beamlet Lithography System
Application:
62/413,470 →
Secure Chips with Serial Numbers
Application:
62/438,548 →
Secure Chips with Serial Numbers
Application:
62/456,144 →
Data Generation for Fabricating Unique Chips Using a Charged Particle Multi-Beamlet Lithography System
Application:
62/458,040 →
Secure Chips with Serial Numbers
Application:
62/458,062 →
Data Generation for Fabricating Unique Chips Using a Charged Particle Multi-Beamlet Lithography System
Application:
62/458,071 →
Data Generation for Fabricating Unique Chips Using a Charged Particle Multi-Beamlet Lithography System
Application:
62/458,082 →
Related Assignments
(19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Mar 15, 2000
From: KRUIT, PIETER
To: TECHNISCHE UNIVERSITEIT DELFT
Reel/Frame 010662/0368 →
Assignment of Assignor's Interest
May 8, 2002
From: TECHNISCHE UNIVERSITEIT DELFT
To: MAPPER LITHOGRAPHY HOLDING B.V.
Reel/Frame 012876/0167 →
Assignment of Assignor's Interest
May 8, 2002
From: MAPPER LITHOGRAPHY HOLDING B.V.
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 012876/0128 →
Assignment of Assignor's Interest
Oct 15, 2002
From: WIELAND, MARCO; KAMPHERBEEK, BERT JAN; KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 013390/0346 →
Assignment of Assignor's Interest
Jun 9, 2003
From: WIELAND, MARCO JAN-JACO; KAMPHERBEEK, BERT JAN; KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 014153/0397 →
Assignment of Assignor's Interest
Jun 10, 2003
From: KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 014159/0374 →
Assignment of Assignor's Interest
Sep 22, 2003
From: KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 014518/0636 →
Assignment of Assignor's Interest
Mar 17, 2004
From: WIELAND, MARCO JAN-JACO; KAMPHERBEEK, BERT JAN; VAN VEEN, ALEXANDER HENDRIK; KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 015823/0512 →
Assignment of Assignor's Interest
Mar 22, 2004
From: WIELAND, JAN-JACO MARCO; SPIJKER, JOHANNES CHRISTIAAN VAN'T; JAGER, REMCO; KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 015123/0812 →
Assignment of Assignor's Interest
Jul 22, 2004
From: KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 015590/0970 →
Assignment of Assignor's Interest
Aug 10, 2004
From: WIELAND, MARCO JAN-JACO; KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 015670/0354 →
Assignment of Assignor's Interest
Dec 2, 2004
From: VAN 'T SPIJKER, JOHANNES CHRISTIAAN; WIELAND, MARCO JAN-JACO; HABEKOTTE, ERNST; VAN DER WILT, FLORIS PEPIJN
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 016046/0552 →
Assignment of Assignor's Interest
Aug 12, 2005
From: KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 016887/0990 →
Assignment of Assignor's Interest
Oct 21, 2005
From: STEENBRINK, STIJN WILLEM HERMAN KAREL; KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 017110/0246 →
Assignment of Assignor's Interest
Oct 18, 2006
From: STEENBRINK, STIJN WILLEM HERMAN KAREL; KRUIT, PIETER; WIELAND, MARCO JAN-JACO
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 018417/0550 →
Assignment of Assignor's Interest
Nov 9, 2006
From: JAGER, REMCO; KASTELIJN, AUKJE ARIANNE ANNETTE; DE BOER, GUIDO; WIELAND, MARCO JAN JACO
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 018532/0928 →
Assignment of Assignor's Interest
Apr 22, 2008
From: SAUNDERS, IAN
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 020839/0541 →
Assignment of Assignor's Interest
Feb 22, 2012
From: KRUIT, PIETER
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 027740/0592 →
Court Appointment
May 7, 2019
From: MAPPER LITHOGRAPHY HOLDING B.V.; MAPPER LITHOGRAPHY IP B.V.; MAPPER LITHOGRAPHY B.V.
To: WITTEKAMP, J.J.
Reel/Frame 049104/0734 →