Patent Application
Provisional
Small
App. No. 60/702,561
· Confirmation No. 2221
Reliability in a maskless lithography system
Provisional Application Expired
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⬇ PDF
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2005-10-24 | PEFR |
Applicant Response to Pre-Exam Formalities Notice | 6 | View | |
| 2005-08-23 | PEFN |
Pre-Exam Formalities Notice | 2 | View | |
| 2005-07-25 | TRNA |
Transmittal of New Application | 3 | View | |
| 2005-07-25 | SPEC |
Specification | 18 | View | |
| 2005-07-25 | CLM |
Claims | 7 | View | |
| 2005-07-25 | ABST |
Abstract | 1 | View | |
| 2005-07-25 | DRW |
Drawings-only black and white line drawings | 7 | View | |
| 2005-07-25 | WFEE |
Fee Worksheet (SB06) | 1 | View |
Inventors
Marco Jan-Jaco Wieland
Delft, NETHERLANDS
Pieter Kruit
Delft, NETHERLANDS
Stijn Willem Herman Karel Steenbrink
Delft, NETHERLANDS
Attorneys & Agents of Record
Prosecution
- Customer No.
- 8791
- Docket No.
- 3531P021Z
- Confirmation No.
- 2221
COURT APPOINTMENT
Recorded 2019-05-07
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Quick Facts
- App. No.
- 60/702,561
- Filed
- 2005-07-25
External Links