Apparatus for generating a plurality of beamlets
View Patent ↗The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
1. An apparatus for generating a plurality of charged particle beamlets, comprising:
a charged particle source for generating a diverging charged particle beam,
a lens array comprising a plurality of lenses,
said lens array further comprising an aperture plate, wherein the aperture plate has an electrically conducting surface and means for defining the electrostatic potential of said surface, and
means for defining an equipotentional surface at a distance from said aperture plate at a different potential than said aperture itself, wherein said means comprises a plate placed at a distance from said aperture plate, wherein said plate having a hole large enough to let the beam pass, and means for defining the electrostatic potential of said plate at a different potential than said aperture plate,
wherein the apparatus comprises a converging means for refracting said diverging charged particle beam, and
wherein the converging means is adapted for refracting a diverging charged particle beam into a substantially parallel charged particle beam for generating a plurality of substantially parallel charged particle beamlets,
wherein said converging means comprises a collimator lens and further comprises an array of converging elements, wherein each element comprises a deflector aligned with a beamlet.
2. The apparatus of claim 1 , wherein said plate having a through hole at the location of the beam of beam of beamlets.
3. The apparatus of claim 2 , wherein said through hole is a circular hole having its center at the optical axis of the charged particle beam.
4. The apparatus of claim 3 , wherein said means for defining an equipotential surface are located between said source and said lens array.
5. The apparatus of claim 1 , wherein said means for defining an equipotential surface are located between said lens array and said converging means.
6. The apparatus of claim 5 , wherein said collimator lens is an electrostatic lens.
7. The apparatus of claim 1 , wherein said charged particle beam is an electron beam.
8. The apparatus of claim 1 , wherein said charged particle beam is an ion beam.
9. A charged particle beam lithography system comprising the apparatus of claim 1 .
10. A substrate processed with the charged particle beam system of claim 1 .
11. A charged particle beam microscopy system comprising the apparatus of claim 1 .
12. The apparatus according to claim 1 , wherein the lens array is arranged to project images of said source in the principal plane of said converging means.
13. The apparatus of claim 1 , wherein said plate is placed essentially parallel to said aperture plate.
14. The apparatus of claim 1 , wherein said plate and said aperture plate are place essentially perpendicular to the optical axis of the charged particle beam.
15. The apparatus of claim 1 , wherein the apparatus comprises blanking means included to modulate said substantially parallel charged particle beamlets.
16. The apparatus of claim 1 , wherein the array of converging elements is arranged behind the collimator lens for substantially correcting a spherical aberration of the collimator lens.
17. The apparatus of claim 1 , wherein the voltage of each deflector is set in such a way that its deflecting effect of on the charged particle beamlet passing the deflector is proportional to the distance of the deflector from the optical axis of the collimator lens to the third power.