Stage device for a vacuum chamber

1. A lithography system, comprising:

a vacuum chamber; and

a transfer stage for moving an object in said vacuum chamber in a plane of movement, said transfer stage comprising at least a first rod and a second rod each having a first and a second end, the first and second rod being connected one to the other with their first ends by means of a first hinge, the second end of the first rod being flexibly connected to a first drive rod for moving said second end, the second end of the second rod being connected to second drive rod for moving said second end, the first hinge being connected to a short stroke stage for the object, and the first and second drive rods being movable in the directions of their respective longitudinal axes.

2. The lithography system according to claim 1 , the first and second drive rods being adapted for moving the second ends of the first and second rod, respectively, along a line in opposite directions.

3. The lithography system according to claim 1 , the second ends of the first and second rod being provided with a second and third hinge, respectively, which hinges are connected to the drive rods.

4. The lithography system according to claim 3 , at least one of the second and third hinge being provided with adjustable locks for the adjustable locking of said hinge.

5. The lithography system according to claim 1 , the first and second drive rods being provided with a controller for adjustable synchronously and a-synchronously driving the second ends of the first and second rod.

6. The lithography system according to claim 3 , wherein the first and second drive rods each run through a wall of the vacuum chamber by means of at least one passage, the drive rods being moveable in their longitudinal direction and at one end being connected to the second and third hinge, respectively.

7. The lithography system according to claim 3 , furthermore comprising a third and fourth rod each having a first and a second end, the third and fourth rod being connected one to the other with their first ends by means of a fourth hinge and the second end of the third rod being connected to the second hinge and the second end of the fourth rod being connected to the third hinge.

8. The lithography system according to claim 7 , the first, second, third and fourth rod together forming a parallelogram.

9. The lithography system according to claim 1 , further comprising a third and fourth rod, the first, second, third and fourth rod being connected hinging one to the other in the shape of a parallelogram and the first and second drive rods being adapted for adjustable change of the shape or the position of the parallelogram.

10. The lithography system according to claim 3 , further comprising a fifth rod, substantially parallel to the first rod and a sixth rod substantially parallel to the fourth rod, the fifth rod being connected to the first hinge and the third hinge, and the sixth rod being connected to the third hinge and the fourth hinge.

11. The lithography system comprising:

a vacuum chamber; and

a transfer stage for moving an object in the vacuum chamber in at least a plane of movement, the transfer stage comprising at least four rods, connected with their ends for forming a parallelogram, two opposite first and second vertices of the parallelogram being connected to drive rods for moving said vertices along one line and the remaining two opposite third and fourth vertices being provided with a chuck for retaining at least one object.

12. Transfer stage for moving at least one object in a vacuum chamber, comprising:

four elements flexibly and elastically connected one to the other by means of hinges, the hinges defining a parallelogram and being situated in one plane;

at least one drive rod, adapted for moving two opposite hinges with respect to each other along the connection line between both hinges, and for moving two opposite hinges jointly; and

a connector for connecting an object to a hinge.

13. Transfer stage according to claim 12 , a drive rod being adapted for both moving two hinges with respect to each other and moving two hinges jointly.

14. Transfer stage according to claim 13 , a drive rod being adapted for moving two opposite hinges both with respect to each other and jointly.

15. The lithography system according to claim 1 , wherein the hinges are flexible and elastic.

16. The lithography system according to claim 15 , wherein the hinges are leaf springs.

17. The lithography system according to claim 1 , wherein the drive rods are magnetically connected to the ends of the rods.

18. The lithography system according to claim 1 , the first and second drive rods being adapted for moving at substantially equal speeds.

19. The lithography system according to claim 1 , wherein said first hinge comprises a corner piece connecting the first rod and the second rod, and wherein the drive rods are adapted for moving said connector in a Y-direction substantially parallel to the longitudinal axes of the drive rods during joint movement of said drive rods, and wherein the drive rods are further adapted for moving said corner piece in an X-direction substantially perpendicular to the longitudinal axes of the drive rods during movement of the drive rods with respect to each other.

20. Transfer stage according to claim 12 , wherein said first hinge comprises a corner piece connecting the first rod and the second rod, wherein the drive rods are adapted for moving said corner piece in a Y-direction substantially parallel to said one line during joint movement of said drive rods, and wherein the drive rods are further adapted for moving said corner piece in an X-direction substantially perpendicular to said one line during movement of the drive rods with respect to each other.