Fabricating unique chips using a charged particle multi-beamlet lithography system
Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, wherein beamlet control data is generated for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices. The beamlet control data is generated based on design layout data defining a plurality of structures, such as vias, for the electronic devices to be manufactured from the wafer, and selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices. Exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.
1. A computer-implemented method for generating beamlet control data for controlling a maskless pattern writer to expose a wafer for creation of electronic devices using a maskless lithographic exposure system using a maskless pattern writer such that exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of structures for different subsets of the electronic devices, the method comprising:
receiving design layout data defining a plurality of structures for the electronic devices to be manufactured from the wafer;
receiving selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices; and
generating the beamlet control data based on the received design layout data and the received selection data.
2. The method according to claim 1 , wherein the step of generating the beamlet control data is additionally based on location meta data, wherein the location meta data specifies locations of the structures defined in the design layout data.
3. The method according to claim 1 , further comprising generating wipe out mask data based on the location meta data and the selection data, and wherein the generating of the beamlet control data comprises merging the wipe out mask data with the design layout data or a derivative of the design layout data to delete non selected structures from the design layout data.
4. A data processing system comprising a processor configured to perform a computer-implemented method for generating beamlet control data for controlling a maskless pattern writer to expose a wafer for creation of electronic devices using a maskless lithographic exposure system using a maskless pattern writer such that exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of structures for different subsets of the electronic devices, the method comprising:
receiving design layout data defining a plurality of structures for the electronic devices to be manufactured from the wafer;
receiving selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices; and
generating the beamlet control data based on the received design layout data and the received selection data.
5. A computer-implemented method for generating selection data, the selection data defining structures of design layout data applicable for an electronic device to be manufactured from a wafer, the method comprising:
generating the selection data by defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, such that the selection data defines a different set of the structures for different subsets of electronic devices.
6. The method according to claim 5 , wherein the generating of the selection data further comprises defining a location of each of the structures within a design layout of the electronic device defined by the design layout data.
7. A data processing system comprising a processor configured to perform a computer-implemented method for generating selection data, the selection data defining structures of design layout data applicable for an electronic device to be manufactured from a wafer, the method comprising:
generating the selection data by defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, such that the selection data defines a different set of the structures for different subsets of electronic devices.
8. A computer program product, implemented on computer-readable non-transitory storage medium, comprising instructions which, when the computer program product is executed by a computer, cause the computer to carry out a computer-implemented method for generating selection data, the selection data defining structures of design layout data applicable for an electronic device to be manufactured from a wafer, the method comprising:
generating the selection data by defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, such that the selection data defines a different set of the structures for different subsets of electronic devices.
9. A computer-readable non-transitory storage medium comprising instructions which, when executed by a computer, cause the computer to carry out a computer-implemented method for generating selection data, the selection data defining structures of design layout data applicable for an electronic device to be manufactured from a wafer, the method comprising:
generating the selection data by defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, such that the selection data defines a different set of the structures for different subsets of electronic devices.
10. The method according to claim 1 , wherein the design layout data comprises:
common design layout data defining structures applicable for all of the electronic devices; and
non-common design layout data defining structures applicable for certain ones of the electronic devices from which the different set of the structures is selectable according to the selection data.
11. The method according to claim 1 , wherein the selection data specifies for each of the electronic devices whether the beamlet control data includes or does not include data defining one or more of the structures defined in the design layout data.
12. The method according to claim 1 , wherein the design layout data only includes design layout data defining the structures selectable according to the selection data.
13. The method according to claim 1 , wherein the step of generating the beamlet control data is additionally based on location meta data, wherein the location meta data specifies locations of the structures defined in the design layout data.
14. The method according to claim 13 , further comprising generating wipe out mask data based on the location meta data and the selection data, and wherein the generating of the beamlet control data comprises merging the wipe out mask data with the design layout data or a derivative of the design layout data to delete non selected structures from the design layout data.
15. The method according to claim 1 , wherein the electronic devices are semiconductor chips, and wherein the maskless pattern writer is a charged particle multi-beamlet lithography machine.
16. The method according to claim 1 , wherein the structures include at least one of:
connections between metal layers, also known as vias;
connections between a metal layer and a gate in a contact layer;
connections in a local interconnect layer; and
P or N implants of certain parts of a transistor or diode.
17. Method of manufacturing electronic devices using a maskless lithographic exposure system comprising a maskless pattern writer, the method comprising:
controlling the maskless pattern writer using beamlet control data generated according to claim 1 , to expose a wafer for creation of the electronic devices
wherein exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.
18. The method according to claim 17 , further comprising:
receiving the design layout data in the maskless lithographic exposure system via a first network path; and
receiving the selection data in the maskless lithographic exposure system via a second network path separate from the first network path.
19. A maskless lithographic exposure system configured to perform a method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, the method comprising:
controlling the maskless pattern writer using beamlet control data generated according to claim 1 , to expose a wafer for creation of the electronic devices
wherein exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.
20. The maskless lithographic exposure system according to claim 19 , comprising a black box device configured to generate the selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices.
21. A semiconductor fabrication plant comprising a maskless lithography exposure system according to claim 19 .