IP Library › Patent Application 61414594
Patent Application Provisional
App. No. 61/414,594 · Confirmation No. 3260

Lithography system and method of refracting a diverging charged particle beam

Provisional Application Expired
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 Code Description Pages PDF
2010-12-29 APP.FILE.REC Filing Receipt 3 View
2010-11-17 SPEC Specification 3 View
2010-11-17 CLM Claims 2 View
2010-11-17 ADS Application Data Sheet 5 View
2010-11-17 DRW.NONBW Drawings-other than black and white line drawings 2 View
2010-11-17 WFEE Fee Worksheet (SB06) 2 View
2010-11-17 N417 Electronic Filing System Acknowledgment Receipt 3 View
2010-11-17 SCORE Placeholder sheet indicating presence of supplemental content in Supplemental Complex Repository for Examiners(SCORE) 1 View
0001-01-03 DRW.SUPP Drawings-black and white line and/or other drawings — View
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Quick Facts
App. No.
61/414,594
Filed
2010-11-17