Charged particle beam lithography system and target positioning device
The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.
1. Stage comprising two stage bases ( 86 ), both arranged on top of a common base plate ( 85 ), wherein each of said stage bases ( 86 ) carries a stage carriage ( 861 ), said stage carriages ( 861 ) being provided with flexures ( 862 ) for connecting a beam to the stage carriages ( 861 ).
2. Stage according to claim 1 , wherein said flexures ( 862 ) lie in different planes.
3. Stage according to claim 1 , wherein each stage carriage ( 861 ) is provided with at least two flexures ( 862 ).
4. Beam ( 84 ) for use in a stage according to claim 1 , said beam ( 84 ), when said stage is in use, bridging the space between the stage bases ( 86 ), wherein said beam ( 84 ) is provided with interface members ( 842 ) for connecting to the flexures ( 862 ).
5. Beam according to claim 4 , further comprising a carriage ( 844 ) wherein said carriage ( 844 ) is provided with interface pins ( 843 ) providing a kinematic mount.
6. Target positioning device ( 5 ) comprising a stage according to claim 1 and a beam according to claim 4 .
7. Target positioning device ( 5 ) according to claim 6 , further comprising an actuator ( 53 ), wherein said actuator ( 53 ) is adapted to apply a force to the stage via a drive member, with the point of application positioned at the level of the centre of gravity ( 57 ) of the target positioning device ( 5 ).
8. Target positioning device ( 5 ) according to claim 7 , wherein two actuators ( 53 ) are provided.
9. Target positioning device ( 5 ) according to claim 8 , wherein the actuators ( 53 ) and the points of application are arranged side by side and eccentrically, as taken in plan view.
10. Charged particle beam lithography system ( 1 ) comprising a target positioning device ( 5 ) according to claim 6 .
11. Charged particle beam lithography system ( 1 ) according to claim 10 further comprising a vacuum chamber accommodating said target positioning device ( 5 ), and wherein the actuator ( 53 ) is arranged outside said vacuum chamber.