Patent Application
Provisional
App. No. 61/414,775
· Confirmation No. 4126
Data Path with Redundancy for lithography apparatus
Inventor:
Marco Jan-Jaco WIELAND
Provisional Application Expired
|
⬇ PDF
|
Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2010-12-17 | APP.FILE.REC |
Filing Receipt | 3 | View | |
| 2010-11-17 | SPEC |
Specification | 24 | View | |
| 2010-11-17 | CLM |
Claims | 2 | View | |
| 2010-11-17 | DRW |
Drawings-only black and white line drawings | 11 | View | |
| 2010-11-17 | ADS |
Application Data Sheet | 4 | View | |
| 2010-11-17 | WFEE |
Fee Worksheet (SB06) | 2 | View | |
| 2010-11-17 | N417 |
Electronic Filing System Acknowledgment Receipt | 3 | View |
Inventors
Marco Jan-Jaco WIELAND
Delft, NETHERLANDS
Attorneys & Agents of Record
Prosecution
- Customer No.
- 32894
- Docket No.
- 03147.0035.USV0
- Confirmation No.
- 4126
COURT APPOINTMENT
Recorded 2019-05-07
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
- App. No.
- 61/414,775
- Filed
- 2010-11-17
External Links