Charged particle lithography system with aperture array cooling
View Patent ↗A charged particle lithography system for pattern transfer onto a target surface, comprising a beam generator for generating a plurality of beamlets, and a plurality of aperture array elements comprising a first aperture array, a blanker array, a beam stop array, and a projection lens array. Each aperture array element comprises a plurality of apertures arranged in a plurality of groups, wherein the aperture groups of each aperture array element form beam areas distinct and separate from non-beam areas formed between the beam areas and containing no apertures for beamlet passage. The beam areas are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas are aligned to form non-beam shafts not having beamlets present therein. The first aperture array element is provided with cooling channels in the non-beam areas for transmission of a cooling medium for cooling the array element.
1. A charged particle lithography system for transferring a pattern onto the surface of a target, comprising:
a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column;
a plurality of aperture array elements comprising a first aperture array, a blanker array, a beam stop array, and a projection lens array;
wherein each aperture array element comprises a plurality of apertures arranged in a plurality of groups, the apertures for letting the beamlets pass through the aperture array element;
wherein the groups of apertures of each aperture array element form beam areas distinct and separate from a plurality of non-beam areas formed between the beam areas and containing no apertures for passage of the beamlets;
wherein the beam areas of the aperture array elements are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas of the aperture array elements are aligned to form non-beam shafts not having beamlets present therein; and
wherein the first aperture array element is provided with cooling channels adapted for transmission of a cooling medium for cooling the first aperture array element, the cooling channels being provided in the non-beam areas of the first aperture array element.
2. The system of claim 1 , wherein the first aperture array element comprises a plate having a thickness in a direction of the axis of the column and a width in a direction perpendicular to the axis of the column, wherein the apertures are formed through the thickness of the plate in the non-beam areas of the plate, and the cooling channels are formed internally in the non-beam areas of the plate and extend in a direction of the width of the plate.
3. The system of claim 1 , wherein the first aperture array element comprises a plate having a thickness in a direction of the axis of the column and a width in a direction perpendicular to the axis of the column, wherein the apertures are formed through the thickness of the plate in the non-beam areas of the plate, and the cooling channels are formed in external elements attached to the plate in the non-beam areas and extending in a direction of the width of the plate, the cooling channels adapted for providing structural support for the first aperture array element.
4. The system of claim 1 , wherein the cooling medium comprises water.
5. The system of claim 1 , further comprising a coolant system for flowing the cooling medium through the cooling channels, the coolant system being adapted to produce turbulent flow of the cooling medium through the cooling channels.
6. The system of claim 1 , wherein the first aperture array is made from a monolithic plate of material in which the apertures and cooling channels are formed.
7. The system of claim 1 , wherein the first aperture array is made from a plate of Tungsten.
8. The system of claim 1 , wherein the first aperture array is made from a plate of Copper or Molybdenum.
9. The system of claim 1 , wherein the plurality of aperture array elements further comprise a current limiting aperture array and a condenser lens array, each comprising a plurality of apertures arranged in a plurality of groups, the apertures for letting the beamlets pass through the aperture array elements, and wherein the groups of apertures of each aperture array element form beam areas distinct and separate from a plurality of non-beam areas formed between the beam areas and containing no apertures for passage of the beamlets, and wherein the beam areas of the aperture array elements are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas of the aperture array elements are aligned to form non-beam shafts not having beamlets present therein.
10. The system of claim 1 , wherein the first aperture array element comprises an integral current limiting aperture array, the apertures of the first aperture array element having a narrowest portion recessed below the upper surface of the first aperture array element.
11. The system of claim 1 , wherein the first aperture array element is provided with a curved upper surface facing towards the beam generator.
12. The system of claim 11 , wherein the first aperture array element is subdivided into alternating aperture-free areas and aperture areas, each aperture area comprising a plurality of apertures, and wherein the curved upper surface encompasses a plurality of the aperture-free areas and aperture areas.
13. The system of claim 11 , wherein the curved upper surface of the first aperture array element forms a raised dome-shaped area protruding above the upper surface towards the beam generator.
14. The system of claim 11 , wherein the curved upper surface of the first aperture array element forms a dome-shaped depression in the upper surface area facing the beam generator.
15. The system of claim 11 , wherein the system has an optical axis and the curved surface is shaped according to a cosine function centred around the optical axis.
16. The system of claim 11 , wherein the circumference of the curved surface is substantially larger than the height of the curved surface.
17. An aperture array element adapted for use in a charged particle lithography system for generating a plurality of beamlets for transferring a pattern onto the surface of a target, the aperture array comprising a plurality of apertures arranged in a plurality of groups, the apertures for letting the beamlets pass through the aperture array element;
wherein the groups of apertures form beam areas distinct and separate from a plurality of non-beam areas formed between the beam areas and containing no apertures for passage of the beamlets; and
wherein the first aperture array element is provided with cooling channels adapted for transmission of a cooling medium for cooling the first aperture array element, the cooling channels being provided in the non-beam areas of the first aperture array element.
18. The aperture array element of claim 17 , wherein the first aperture array element comprises a plate having a thickness and a width, wherein the apertures are formed through the thickness of the plate in the non-beam areas of the plate, and the cooling channels are formed internally in the non-beam areas of the plate and extend in a direction of the width of the plate.
19. The aperture array element of claim 17 , wherein the first aperture array element comprises a plate having a thickness and a width, wherein the apertures are formed through the thickness of the plate in the non-beam areas of the plate, and the cooling channels are formed in external elements attached to the plate in the non-beam areas and extending in a direction of the width of the plate, the cooling channels adapted for providing structural support for the first aperture array element.
20. The aperture array element of claim 17 , wherein the cooling medium comprises water.
21. The aperture array element of claim 17 , further comprising a coolant system for flowing the cooling medium through the cooling channels, the coolant system being adapted to produce turbulent flow of the cooling medium through the cooling channels.
22. The aperture array element of claim 17 , wherein the first aperture array is made from a monolithic plate of material in which the apertures and cooling channels are formed.
23. The aperture array element of claim 17 , wherein the first aperture array is made from a plate of Tungsten.
24. The aperture array element of claim 17 , wherein the first aperture array is made from a plate of Copper or Molybdenum.
25. The aperture array element of claim 17 , wherein the first aperture array element comprises an integral current limiting aperture array, the apertures of the first aperture array element having a narrowest portion recessed below the upper surface of the first aperture array element.
26. The aperture array element of claim 17 , wherein the aperture array element comprises a plate, the plate being provided with a curved upper surface facing towards a beam direction.
27. The aperture array element of claim 26 , wherein the aperture array element is subdivided into alternating aperture-free areas and aperture areas, each aperture area comprising a plurality of apertures, and wherein the curved upper surface encompasses a plurality of the aperture-free areas and aperture areas.
28. The aperture array element of claim 26 , wherein the curved upper surface of the aperture array forms a raised dome-shaped area protruding above the upper surface towards the charged particle source.
29. The aperture array element of claim 26 , wherein the curved upper surface of the aperture array forms a dome-shaped depression in the upper surface area facing the charged particle source.
30. The aperture array element of claim 26 , wherein the system has an optical axis and the curved surface is shaped according to a cosine function centred around the optical axis.
31. The aperture array element of claim 26 , wherein the circumference of the curved surface is substantially larger than the height of the curved surface.
32. A charged particle beam generator, comprising:
a charged particle source adapted for generating a diverging charged particle beam;
a collimating system for refracting the diverging charged particle beam, the collimating system comprising a first electrode; and
an aperture array element according to claim 17 , the aperture array element forming a second electrode;
wherein the system is adapted for creating an accelerating electric field between the first electrode and the second electrode.