IP Library Assignment 015858/0641
Patent Assignment
Reel/Frame 015858/0641

Assignment of Assignor's Interest

Recorded: 2004-09-30 Pages: 3
Assignors
HATAKEYAMA, JUN
Executed: 2004-09-14
WATANABE, SATOSHI
Executed: 2004-09-14
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1 OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Photoresist Undercoat-Forming Material and Patterning Process
Patent: 7,303,855 →
Application: 10/952,834 →
Publication: US 2006/0019195