Patent Assignment
Reel/Frame 016072/0226
Assignment of Assignor's Interest
Recorded: 2004-12-15
Pages: 3
Assignees
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN
ANELVA CORPORATION
5-8-1, YOTSUYA, FUCHU-SHI, TOKYO, JAPAN
Covered Property
(1)
Remote Plasma Apparatus for Processing Substrate with Two Types of Gases