IP Library Assignment 016118/0228
Patent Assignment
Reel/Frame 016118/0228

Assignment of Assignor's Interest

Recorded: 2005-01-03 Pages: 5
Assignors
USHIKU, YUKIHIRO
Executed: 2004-10-01
OGAWA, AKIRA
Executed: 2004-10-26
KAKINUMA, HIDENORI
Executed: 2004-10-12
SHUTO, SHUNJI
Executed: 2004-10-26
ABE, MASAHIRO
Executed: 2004-11-12
AKIYAMA, TATSUO
Executed: 2004-10-12
KOMATSU, SHIGERU
Executed: 2004-10-02
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Semiconductor Device Manufacturing System and Method for Manufacturing Semiconductor Devices Including Calculating Oxide Film Thickness Using Real Time Simulator
Patent: 7,702,413 →
Application: 10/935,430 →
Publication: US 2005/0095774