Patent Assignment
Reel/Frame 016144/0622
Assignment of Assignor's Interest
Recorded: 2005-04-25
Pages: 3
Assignors
SEO, HYEOUNG-WON
Executed: 2005-03-10
YANG, WOUN-SUCK
Executed: 2005-03-03
SONG, DU-HEON
Executed: 2005-03-10
YOON, JAE-MAN
Executed: 2005-03-03
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, (SOUTH), KOREA, REPUBLIC OF
Covered Property
(1)
Method of Fabricating Fin Field Effect Transistor Using Isotropic Etching Technique