Patent Assignment
Reel/Frame 016160/0106
Assignment of Assignor's Interest
Recorded: 2005-01-11
Pages: 3
Assignors
SUH, BONG-SEOK
Executed: 2004-12-23
PARK, KI-CHUL
Executed: 2005-01-05
CHOI, SEUNG-MAN
Executed: 2005-01-05
KIM, IL-RYONG
Executed: 2004-12-23
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416, MAETAN-DONG, YEONGTONG-GU,, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property
(1)
Method of Fabricating Semiconductor Device by Forming Diffusion Barrier Layer Selectively and Semiconductor Device Fabricated Thereby