Reassignment and Release of Security Interest

Recorded: 2005-06-23 Received: 2005-06-23 Pages: 3

Assignor

Executed: 2005-06-21

Assignee

SCP GLOBAL TECHNOLOGIES, INC.

400 BENJAMIN LANE, BOISE, ID, 83704, UNITED STATES

Covered Properties (2)

Composition and method for removing photoresist and/or resist residue using supercritical fluids

Application: 10/197,384 →

Apparatus and Method for Single Substrate Processing

Application: 10/010,240 →